 Scanning electron microscopy with Electron-beam Lithography  Class 1000 cleanroom. |
KU's Nanofacrication facility is equipped with capability for fabrication electronic devices at micrometer to
nanometer scales.
The microfabrication facilities are located in a class 100 cleanroom and a class 1000 cleanroom. Major pieces of equipment include: including Deep UV Mask Aligner, e-beam evaporator, plasma etcher, wire bonder, and probe station. The manufacture specified feature dimension is in the range of 0.2-0.3 micrometers. The nanofabrication is carried out in a Jeol 6380 scanning electron microscope (SEM) equipped with Nabity e-beam lithographic package for electron beam lithography. Device feature dimension in several to tens of nanometers has been demonstrated. The same SEM can also be applied to image the samples and fabricated electronic devices. The spatial resolution is as small as 3 nanometers. KU Nanofab facility is open to all KU researchers. Most
facilities are free except SEM-EBL system and a moderate charge plan at
$15/hour plus $10/each-use has been approved by KU controller office.
Trainining to use the facility can be arranged via communication with
Professor Judy Wu.
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